Charged particle beam apparatus and method utilizing liquid meta

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

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250281, 250423R, H01J 3148, H01J 188

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active

044265824

ABSTRACT:
A liquid metal field ionization source is used in conjunction with a three element asymmetric lens system to provide an ion gun having greater magnitude beam currents focused on a smaller spot size than has been previously possible for intermediate energy beams. An ultra-clean emitter surface is achieved by means of an argon sputtering and/or plasma etching process applied to the emitter surface before liquid metal is applied to the emitter surface to ensure uniform and sufficient flow of liquid metal to the apex of the emitter. The three element asymmetric lens system has a very low chromatic aberration coefficient, enabling precise focusing of beams with large energy spreads. For beam accelerating ratios in the range from 0.2 to 6, the ion gun produces very high current densities in beams focused on very small spot areas, despite the relatively large energy spread of beams produced by liquid metal ionization sources. The energy spread of the ion beam is minimized by operating the emitter at a voltage close to the onset voltage and at a temperature close to the melting point of the liquid metal.

REFERENCES:
patent: 2665384 (1954-01-01), Yockey
patent: 2978580 (1961-04-01), Von Ardenne
patent: 3287598 (1966-11-01), Brooks
patent: 3405263 (1968-10-01), Wanless
patent: 4209696 (1980-06-01), Fite
patent: 4320295 (1982-03-01), Eloy
"Electrohydrodynamic Ion Source" by Mahoney et al., J. Applied Physics, vol. 49, No. 13, Dec. 1969, pp. 5101-5106.
Electron Optics and the Electron Microscope by Zworykin et al., Sections 16.6, pp. 571-577, (1946).

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