Charged particle beam apparatus and method of forming...

Radiant energy – Irradiation of objects or material

Reexamination Certificate

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C250S492200, C250S492230, C250S306000, C250S310000, C216S063000, C438S690000

Reexamination Certificate

active

11196094

ABSTRACT:
A focused ion beam apparatus having two pieces of probers brought into contact with two points of a surface of a sample, a voltage source for applying a constant voltage between the two points with which the probers are brought into contact, and an ammeter for measuring a current flowing between the two points, in which a conductive film is formed to narrow a gap thereof between the two points by operating a deflection electrode and a gas gun and the current flowing between the two points is monitored, and when the current becomes a predetermined value, a focused charged particle beam irradiated to the surface of the sample is made OFF by the blanking electrode.

REFERENCES:
patent: 5852298 (1998-12-01), Hatakeyama et al.
patent: 6452174 (2002-09-01), Hirose et al.
patent: 6716301 (2004-04-01), Kanno et al.
patent: 6794663 (2004-09-01), Shichi et al.
patent: 7060196 (2006-06-01), Makarov et al.
patent: 7071475 (2006-07-01), Tomimatsu et al.
patent: 7103505 (2006-09-01), Teshima et al.
patent: 7106425 (2006-09-01), Bultman et al.
patent: 7138628 (2006-11-01), Tomimatsu et al.
patent: 7176458 (2007-02-01), Tomimatsu et al.
patent: 7205237 (2007-04-01), Deering et al.
patent: 7241994 (2007-07-01), Hasegawa et al.

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