Charged particle beam apparatus

Details Charged particle beam apparatus Charged particle beam apparatus

1985-08-23

1987-10-20

Fields, Carolyn E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396R, 250396ML, 250398, G21K 504

Patent

active

047016230

ABSTRACT:
An apparatus, such as an electron beam column (1), with high-speed deflection capability comprises a gun (2) which directs a beam (3) of charged particles by several magnetic lenses (9,11,13a,13b) towards a target (4). Magnetic deflection coils (12a,12b) produce a variable magnetic field for controllably deflecting the beam. The beam is surrounded by an electrically conductive surface (16a,16b,22) which in the vicinity of the deflection coils is constituted by a tube (22) comprising a single wire of, for example, nichrome preferably coated by an oxide film formed naturally and comprising a close-wound helix. This tube construction has a longitudinal resistance which significantly impedes the flow of undesirable eddy currents therein. On the other hand the tube can readily conduct along a helical path so that charge accumulation on the tube walls is avoided.

REFERENCES:
patent: 3787696 (1974-01-01), Dao et al.
"A Self-Cleaning Electron Microscope Aperture Diaphragm", by G. J. S. Zhadanov, Sov. J. Opt. Technol., vol. 41, No. 9, Sep. 1974.

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