Charged particle beam apparatus

Details Charged particle beam apparatus Charged particle beam apparatus

1996-06-25

1998-05-05

Berman, Jack I.

Radiant energy

Means to align or position an object relative to a source or...

H01J 3722, H01J 3728

Patent

active

057478163

ABSTRACT:
In a scanning electron microscope, a couple of fiducial patterns which are so laid out on the X-Y stage as to be separated with a distance equivalent to the distance between the optical axis of the optical microscope and the optical axis of the electronic optical system, the image signals of these patterns are captured by the image processing circuit, the position shift of the optical axis of the optical microscope and the position shift of the optical axis of the electronic optical system with respect to the fiducial patterns are obtained by numerical calculation, and then, this position shift is used as an offset value in the actual measurement by the scanning electron microscope, which leads to an accurate positioning.

REFERENCES:
patent: 4447731 (1984-05-01), Kuni et al.
patent: 4785187 (1988-11-01), Kariya et al.
patent: 5117110 (1992-05-01), Yasutake
patent: 5608226 (1997-03-01), Yamada et al.
Patent Abstracts Of Japan, vol. 013, No. 269, (P-888), Jun. 21, 1989 & JP-A-01 061718 (Nikon Corp), Mar. 8, 1989.

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