Charged beam processing apparatus

Details Charged beam processing apparatus Charged beam processing apparatus

2007-02-23

2009-11-03

Wells, Nikita (Department: 2881)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S022000

Reexamination Certificate

active

07611810

ABSTRACT:
A charged beam processing apparatus for processing an object to form structures on the object includes a processing chamber, a multi-charged beam optical system configured to generate a plurality of charged beams, and to converge and to deflect the plurality of charged beams to irradiate the object in the processing chamber with the plurality of charged beams, and a supply port configured to supply a gas into the processing chamber. The multi-charged beam optical system includes (i) a lens array, and (ii) a pattern forming plate configured to select a portion of the lens array to be used to form the structures. The charged beam processing apparatus includes a controller configured to control an exchange of the pattern forming plate in accordance with an arrangement pattern of the structures to be formed on the object.

REFERENCES:
patent: 4785187 (1988-11-01), Kariya et al.
patent: 4812662 (1989-03-01), Goto et al.
patent: 4897552 (1990-01-01), Okunuki et al.
patent: 4974736 (1990-12-01), Okunuki et al.
patent: 5525806 (1996-06-01), Iwasaki et al.
patent: 5831715 (1998-11-01), Takahashi
patent: 6037601 (2000-03-01), Okunuki
patent: 6054713 (2000-04-01), Miyake et al.
patent: 6117598 (2000-09-01), Imai
patent: 6303932 (2001-10-01), Hamamura et al.
patent: 6603128 (2003-08-01), Maehara et al.
patent: 6699630 (2004-03-01), Ota
patent: 6758900 (2004-07-01), Matsui
patent: 6787784 (2004-09-01), Okunuki
patent: 6872950 (2005-03-01), Shimada et al.
patent: 6872951 (2005-03-01), Yagi et al.
patent: 6903345 (2005-06-01), Ono et al.
patent: 6953938 (2005-10-01), Iwasaki et al.
patent: 6965153 (2005-11-01), Ono et al.
patent: 7060984 (2006-06-01), Nagae et al.
patent: 7109494 (2006-09-01), Ono et al.
patent: 7189979 (2007-03-01), Okunuki et al.
patent: 2004/0061064 (2004-04-01), Ono et al.
patent: 2005/0077475 (2005-04-01), Nagae et al.
patent: 5-047636 (1993-02-01), None
patent: 2001-107252 (2001-04-01), None
patent: 2004-244649 (2004-09-01), None
patent: 2004-345009 (2004-12-01), None
A. N. Broers, et al., “Electron-Beam Fabrication of 80-Å Metal Structures”, Nov. 1976, pp. 596-598.
S. Matsui, K. Mori, “New Selective Deposition Technology By Electron Beam Induced Surface Reaction”, Jan./Feb. 1986, pp. 299-304.
H. W. P. Koops, R. Weiel, D. P. Kern & T. H. Baum, “High-Resolution Electron-Beam Induced Deposition”, Jan./Feb. 1988, pp. 477-481.

Affiliated with

Also associated with

Rating

Charged beam processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charged beam processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged beam processing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4089944