Charged beam processing apparatus

Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement

Reexamination Certificate

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C430S022000

Reexamination Certificate

active

07611810

ABSTRACT:
A charged beam processing apparatus for processing an object to form structures on the object includes a processing chamber, a multi-charged beam optical system configured to generate a plurality of charged beams, and to converge and to deflect the plurality of charged beams to irradiate the object in the processing chamber with the plurality of charged beams, and a supply port configured to supply a gas into the processing chamber. The multi-charged beam optical system includes (i) a lens array, and (ii) a pattern forming plate configured to select a portion of the lens array to be used to form the structures. The charged beam processing apparatus includes a controller configured to control an exchange of the pattern forming plate in accordance with an arrangement pattern of the structures to be formed on the object.

REFERENCES:
patent: 4785187 (1988-11-01), Kariya et al.
patent: 4812662 (1989-03-01), Goto et al.
patent: 4897552 (1990-01-01), Okunuki et al.
patent: 4974736 (1990-12-01), Okunuki et al.
patent: 5525806 (1996-06-01), Iwasaki et al.
patent: 5831715 (1998-11-01), Takahashi
patent: 6037601 (2000-03-01), Okunuki
patent: 6054713 (2000-04-01), Miyake et al.
patent: 6117598 (2000-09-01), Imai
patent: 6303932 (2001-10-01), Hamamura et al.
patent: 6603128 (2003-08-01), Maehara et al.
patent: 6699630 (2004-03-01), Ota
patent: 6758900 (2004-07-01), Matsui
patent: 6787784 (2004-09-01), Okunuki
patent: 6872950 (2005-03-01), Shimada et al.
patent: 6872951 (2005-03-01), Yagi et al.
patent: 6903345 (2005-06-01), Ono et al.
patent: 6953938 (2005-10-01), Iwasaki et al.
patent: 6965153 (2005-11-01), Ono et al.
patent: 7060984 (2006-06-01), Nagae et al.
patent: 7109494 (2006-09-01), Ono et al.
patent: 7189979 (2007-03-01), Okunuki et al.
patent: 2004/0061064 (2004-04-01), Ono et al.
patent: 2005/0077475 (2005-04-01), Nagae et al.
patent: 5-047636 (1993-02-01), None
patent: 2001-107252 (2001-04-01), None
patent: 2004-244649 (2004-09-01), None
patent: 2004-345009 (2004-12-01), None
A. N. Broers, et al., “Electron-Beam Fabrication of 80-Å Metal Structures”, Nov. 1976, pp. 596-598.
S. Matsui, K. Mori, “New Selective Deposition Technology By Electron Beam Induced Surface Reaction”, Jan./Feb. 1986, pp. 299-304.
H. W. P. Koops, R. Weiel, D. P. Kern & T. H. Baum, “High-Resolution Electron-Beam Induced Deposition”, Jan./Feb. 1988, pp. 477-481.

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