Charged beam lithography apparatus and method thereof

Details Charged beam lithography apparatus and method thereof Charged beam lithography apparatus and method thereof

1997-08-25

1999-08-03

Metjahic, Safet

Photocopying

Projection printing and copying cameras

250310, G03B 2700, G01N 2300

Patent

active

059332115

ABSTRACT:
A charged beam lithography apparatus simultaneously uses multiple charged beams to irradiate a workpiece. In specific embodiments, collimators are employed to assist in aligning the multiple charged beams by eliminating "noise" from reflections of other beams. Each collimator is positioned to correspond with respective of the charged beams and detectors for detecting reflected particles from the charged beams. The particles are reflected from particular marks used in the alignment process. Each collimator helps to prevent particles from adjacent charged beams from entering a detector that corresponds with a specific charged beam.

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N. Shimazu, et al., "An Approach to a High-Throughput E-Beam Writer with a Single-Gun Multiple-Path System", JPN. J. Appl. Phys., vol. 34, No. 12B, Dec. 1995, pp. 6689-6695.

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