Charged beam exposure apparatus and method for manufacturing...

Details Charged beam exposure apparatus and method for manufacturing... Charged beam exposure apparatus and method for manufacturing...

2008-05-06

2008-05-06

Nguyen, Kiet T (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492230

Reexamination Certificate

active

11378471

ABSTRACT:
A exposure apparatus includes a charged beam radiating unit configured to radiate a charged beam, a shaping unit including an opening for shaping the beam, a storage unit to store a history of data concerning a beam area of the beam on the shaping unit, a predicting unit to predict change amount of dimensions of the beam passing through the opening to design dimensions of the opening, the predicting the change amount being carried out based on a relation between the beam area previously prepared and change amount of the dimensions of the beam passing through the opening to the design dimensions of the opening, and a correcting unit to correct dimension of a pattern which corresponds to the beam and is to be formed on the sample based on the change amount predicted by the predicting unit.

REFERENCES:
patent: 4647782 (1987-03-01), Wada et al.
patent: 6114708 (2000-09-01), Kojima et al.
patent: 7002167 (2006-02-01), Ogasawara
patent: 7122809 (2006-10-01), Ogasawara
patent: 3431445 (2003-05-01), None

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