Charged beam drawing data creation method, charged beam...

Details Charged beam drawing data creation method, charged beam... Charged beam drawing data creation method, charged beam...

2008-05-06

2008-05-06

Kim, Robert (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, C250S492100, C250S492300, C716S030000, C716S030000, C430S296000

Reexamination Certificate

active

07368735

ABSTRACT:
Drawing-data creating method includes selecting charged beam drawing-apparatus dividing drawing area into main fields, subfields and unit fields (U-fields), dividing design data (D-data) corresponding to pattern drawn on area into first D-data corresponding to main fields, dividing first D-data into second D-data corresponding to subfields, dividing second D-data into third D-data corresponding to U-fields, evaluating resist resolution to predetermined dimension on U-fields, creating table relating U-fields to resolution based on result of evaluating the resolution, judging whether third D-data corresponds to data having the dimension and corresponds to pattern falling in U-field having rejectable resolution is based on the dimension and table, and converting data judged to correspond to the data among third D-data into first drawing-data after coordinate conversion so that the data fall in U-field having acceptable resolution, and converting data judged not to correspond to the data among third D-data into second drawing-data without coordinate conversion.

REFERENCES:
patent: 5879860 (1999-03-01), Rosolen et al.
patent: 5955738 (1999-09-01), Manabe et al.
patent: 6103434 (2000-08-01), Onoda
patent: 6104035 (2000-08-01), Muraki
patent: 3085918 (2000-07-01), None
patent: 3125724 (2000-11-01), None
patent: 3168996 (2001-03-01), None

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