Charge-up prevention method and ion implanting apparatus

Details Charge-up prevention method and ion implanting apparatus Charge-up prevention method and ion implanting apparatus

1998-04-03

2000-03-28

Berman, Jack

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250397, H01J 37304

Patent

active

060434996

ABSTRACT:
A charge-up prevention method for use when ion beams are implanted simultaneously with electrons, prevents charge-up on a plurality of objects to be irradiated. A supply quantity of electrons is controlled while directly measuring the potential of the objects that are to be irradiated, and an ion implanting apparatus which irradiates ion beams onto objects which are arranged in a circular shape and moving while rotating, includes an electron source irradiating simultaneously ion beams and electrons for charge prevention, and a controller for controlling a supply quantity of electrons while directly measuring the potential of objects to be irradiated.

REFERENCES:
patent: 4675530 (1987-06-01), Rose et al.
patent: 5126576 (1992-06-01), Wauk, II et al.
patent: 5326980 (1994-07-01), Tajima et al.
patent: 5466929 (1995-11-01), Sakai et al.

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