Charge trapping non-volatile memory with two trapping...

Static information storage and retrieval – Floating gate – Multiple values

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C365S185270, C365S185280, C365S185290

Reexamination Certificate

active

07106625

ABSTRACT:
A multiple-gate memory cell comprises a semiconductor body and a plurality of gates arranged in series on the semiconductor body. A charge storage structure on the semiconductor body includes two charge trapping locations beneath each of all or some of the gates in the plurality of gates. Circuitry to conduct source and drain bias voltages to the semiconductor body near a first gate and a last gate in the series, and circuitry to conduct gate bias voltages to the plurality of gates are included. The multiple-gate memory cell includes a continuous, multiple-gate channel region beneath the plurality of gates in the series, with charge storage locations between some or all of the gates.

REFERENCES:
patent: 4959812 (1990-09-01), Momodomi et al.
patent: 5270969 (1993-12-01), Iwahashi
patent: 5278439 (1994-01-01), Ma et al.
patent: 5355464 (1994-10-01), Fandrich et al.
patent: 5408115 (1995-04-01), Chang
patent: 5424569 (1995-06-01), Prall
patent: 5448517 (1995-09-01), Iwahashi
patent: 5483486 (1996-01-01), Javanifard et al.
patent: 5485422 (1996-01-01), Bauer et al.
patent: 5509134 (1996-04-01), Fandrich et al.
patent: 5515324 (1996-05-01), Tanaka
patent: 5566120 (1996-10-01), D'Souza
patent: 5602775 (1997-02-01), Vo
patent: 5644533 (1997-07-01), Lancaster et al.
patent: 5694356 (1997-12-01), Wong et al.
patent: 5745410 (1998-04-01), Yiu et al.
patent: 5753950 (1998-05-01), Kojima
patent: 5768192 (1998-06-01), Eitan
patent: RE35838 (1998-07-01), Momodomi et al.
patent: 5895949 (1999-04-01), Endoh et al.
patent: 5966603 (1999-10-01), Eitan
patent: 6011725 (2000-01-01), Eitan
patent: 6034896 (2000-03-01), Ranaweera et al.
patent: 6074917 (2000-06-01), Chang et al.
patent: 6096603 (2000-08-01), Chang et al.
patent: 6151248 (2000-11-01), Harari et al.
patent: 6172907 (2001-01-01), Jenne
patent: 6194272 (2001-02-01), Sung
patent: 6215148 (2001-04-01), Eitan
patent: 6219276 (2001-04-01), Parker
patent: 6297096 (2001-10-01), Boaz
patent: 6320786 (2001-11-01), Chang et al.
patent: 6363013 (2002-03-01), Lu et al.
patent: 6396741 (2002-05-01), Bloom et al.
patent: 6436768 (2002-08-01), Yang et al.
patent: 6458642 (2002-10-01), Yeh et al.
patent: 6487114 (2002-11-01), Jong et al.
patent: 6512696 (2003-01-01), Fan et al.
patent: 6522585 (2003-02-01), Pasternak
patent: 6538923 (2003-03-01), Parker
patent: 6552386 (2003-04-01), Wu
patent: 6566699 (2003-05-01), Eitan
patent: 6587903 (2003-07-01), Roohparvar
patent: 6614070 (2003-09-01), Hirose et al.
patent: 6614694 (2003-09-01), Yeh et al.
patent: 6643181 (2003-11-01), Sofer et al.
patent: 6643185 (2003-11-01), Wang et al.
patent: 6645813 (2003-11-01), Hsieh
patent: 6646924 (2003-11-01), Tsai et al.
patent: 6657894 (2003-12-01), Yeh et al.
patent: 6670240 (2003-12-01), Ogura et al.
patent: 6670671 (2003-12-01), Sasago et al.
patent: 6690601 (2004-02-01), Yeh et al.
patent: 6714457 (2004-03-01), Hsu et al.
patent: 6798012 (2004-09-01), Ma et al.
patent: 6829175 (2004-12-01), Tsai et al.
patent: 6856551 (2005-02-01), Mokhlesi et al.
patent: 6885044 (2005-04-01), Ding
patent: 6912163 (2005-06-01), Zheng et al.
patent: 6933555 (2005-08-01), Hsieh
patent: 6937511 (2005-08-01), Hsu et al.
patent: 2002/0167844 (2002-11-01), Han et al.
patent: 2002/0179958 (2002-12-01), Kim
patent: 2003/0036250 (2003-02-01), Lin et al.
patent: 2003/0185055 (2003-10-01), Yeh et al.
patent: 2004/0084714 (2004-05-01), Ishii et al.
patent: 2004/0145024 (2004-07-01), Chen et al.
patent: 2005/0001258 (2005-01-01), Forbes
patent: 2006/0044872 (2006-03-01), Nazarian
patent: 09162313 (1997-06-01), None
patent: 11233653 (1999-08-01), None
patent: WO 94/28551 (1994-12-01), None
U.S. Appl. No. 10/855,286, filed May 26, 2004, entitled “Nand-Type Non-Volatile Memory Cell and Method for Operating Same,” 15 pages.
U.S. Appl. No. 11/085,458, filed Mar. 21, 2005, entitled “Charge Trapping Non-Volatile Memory and Method for Gate-by-Gate Erase for Same,” 73 pages.
U.S. Appl. No. 11/085,325, filed Mar. 21, 2005, entitled “Memory Array Including Multiple-Gate Charge Trapping Non-Volatile Cells,” 74 pages.
U.S. Appl. No. 11/085,300, filed Mar. 21, 2005, entitled “Charge Trapping Non-Volatile Memory and Method for Operating Same,” 73 pages.
U.S. Appl. No. 60/585,658, filed Jul. 6, 2004, entitled “Charge Trapping Non-Volatile Memory Cell and Method of Operating Same,” 26 pages.
U.S. Appl. No. 11/085,444, filed Mar. 21, 2005, entitled “Method for Manufacturing a Multiple-Gate Charge Trapping Non-Volatile Memory,” 71 pages.
U.S. Appl. No. 11/118,839, filed Apr. 29, 2005, entitled “Inversion Bit Line, Charge Trapping Non-Volatile Memory and Method of Operating Same,” 34 pages.
Chang, Kuo-Tung, et al., “A New SONOS Memory Using Source-Side Injection for Programming,” IEEE Electron Device Letters, vol. 19, No. 7, Jul. 1998, 253-255.
Eitan, Boaz, et al., “NROM: A Novel Localized Trapping, 2-Bit Nonvolatile Memory Cell,” IEEE Electron Device Letters, vol. 21, No. 11, Nov. 2000, 543-545.
Fujiwara, I., et al., “0.13 μm MONOS single transistor memory cell with separated source lines,” IEDM 1998, 995-998.
Kobayashi, T., et al., “A Giga-Scale Assist-Gate (AG)-AND-Type Flash Memory Cell with 20-MB/s Programming Throughput for Content-Downloading Applications,” IEDM 2001, 2.2.1-2.2.4.
Naruke, K., et al., “Nonvolatile Semiconductor Memories: Technologies, design and application,” C. Hu. Ed., New York, IEEE Press, 1991, Ch. 5, pp. 183-186.
Sasago, Y, et al., “90-nm-node multi-level AG-AND type flash memory with cell size of true 2 F2/bit and programming throughput of 10MB/s,” IEEE, 2003, 4 pages.
Bude, J.D., et al. “Secondary Electron Flash—a High Performance, Low Power Flash Technology for 0.35 μm and Below,” Electron Devices Meeting, 1997. Technical Digest, International, Dec. 7-10, 1997, 279-282.
Chung, Steve S., et al., “A Novel Leakage Current Separation Technique in a Direct Tunneling Regime Gate Oxide SONOS Memory Cell,” Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International, Dec. 8-10, 2003 pp. 26.6.1-26.6.4.
Chung, Steve S., “Low Voltage/Power and High Speed Flash Memory Technology for High Performance and Reliability,” The 3rd WIMNACT—Singapore, Oct. 15, 2003, 1-48.
De Blauwe, Jan, “Nanocrystal Nonvolatile Memory Devices,” IEEE Transactions on Nanotechnology, vol. 1, No. 1, Mar. 2002, 72-77.
Eitan, Boaz, “Can NROM, a 2-bit, Trapping Storage NVM Cell, Give a Real Challenge to Floating Gate Cells?” SSDM, Tokyo, Japan (1999), 3 pages.
Hirose, M., “Challenges for Future Semiconductor Development,” Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International, Nov. 6-8, 2002, pp. 2-3, plus 24 pages from outline.
Huff, H.R. and Bevan, M., assemblers, “Questions at the International Workshop on Gate Insulators,” Ad Hoc Meeting on High-k Gate Dielectrics at the Semiconductor Interface Specialists Conference, Nov. 30, 2001, 3 pages.
Janai, Meir, “Data Retention, Endurance and Acceleration Factors of NROM Devices,” IEEE 41st Annual International Reliability Physics Symposium, Dallas, Texas, 2003, 502-505.
Lee, Chang Hyun, et al. “A Novel SONOS Structure of SiO2/SiN/Al2O3 with TaN Metal Gate for Multi-Giga Bit Flash Memories,” Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International, Dec. 8-10, 2003, 26.5.1-26.5.4.
Lee, Changhyun, et al., “A Novel Structure of SiO2/SiN/High k Dielectrics, Al2O3 for SONOS Type Flash Memory,” Extended Abstracts of the 2002 International Conference on Solid State Devices and Materials, Sep. 17-19, 2002, Nagoya, 162-163.
Lee, Jae-Duk, et al., “Effects of Floating-Gate Interference on NAND Flash Memory Cell Operation,” IEEE Electron Device Letters, vol. 23, No. 5, May 2002, 264-266.
Liu, Zhizheng, et al., “A Ne

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Charge trapping non-volatile memory with two trapping... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charge trapping non-volatile memory with two trapping..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charge trapping non-volatile memory with two trapping... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3534075

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.