Charge transfer device, process for its manufacture, and method

Details Charge transfer device, process for its manufacture, and method Charge transfer device, process for its manufacture, and method

1991-11-12

1994-05-24

Munson, Gene M.

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Charge transfer device

257246, 257248, 257250, H01L 29796

Patent

active

053151372

ABSTRACT:
The present invention relates to a charge transfer device having high transfer efficiency without leaving over signal charges, a charge transfer device substantially shortened in the gate length so as to enhance the transfer speed, and a method of manufacturing and a method of driving such device. In the charge transfer device of the invention, the n.sup.- diffusion layer is formed on the semiconductor substrate. In the surface region of the n.sup.- diffusion layer, a plurality of n diffusion layers are formed at equal intervals. The interval of the adjacent n diffusion layers is about 5 to 10 .mu.m. On the n.sup.- diffusion layer, an insulation film is formed. On the insulation film, transfer electrodes having two different shapes are formed. The transfer electrodes of these two types are alternately arranged. These transfer electrodes differ in length. The length of the longer transfer electrodes is about twice the length of the shorter transfer electrodes. Furthermore, the right end of the n diffusion layer nearly coincides with the right end of the longer transfer electrodes formed on the gate oxide film in the spatial position.

REFERENCES:
patent: 3796932 (1974-03-01), Amelio et al.
patent: 4691218 (1987-09-01), Boudewijns
patent: 4910569 (1990-03-01), Erhardt
patent: 4992842 (1991-02-01), Yang et al.
patent: 5065203 (1991-11-01), Yang et al.

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