Charge pattern development method and apparatus

Details Charge pattern development method and apparatus Charge pattern development method and apparatus

1975-09-04

1978-11-21

Esposito, Michael F.

Coating processes

Measuring, testing, or indicating

Thickness or uniformity of thickness determined

118659, 346 75, 346153, 361228, 355 10, 427 24, G03G 1310, G03G 1510

Patent

active

041267117

ABSTRACT:
A liquid developer is presented to a charge pattern on a photoconductor surface as an evenly distributed array of droplets passing tangentially to it. The droplets emanate from a series of jets and are spread into an even pattern electromagnetically. The charge pattern is developed by the droplet which it draws to the photoconductor surface.

REFERENCES:
patent: 2633796 (1953-04-01), Pethick
patent: 2858798 (1958-11-01), Sedlacsik
patent: 3068115 (1962-12-01), Gundlach
patent: 3176653 (1965-04-01), Hansen
patent: 3298030 (1967-01-01), Lewis et al.
patent: 3560204 (1971-02-01), Damm
patent: 3576623 (1971-04-01), Snelling
patent: 3656173 (1972-04-01), Fussel
patent: 3673601 (1972-06-01), Hertz
patent: 3810193 (1974-05-01), Metcalfe et al.
patent: 4068585 (1978-01-01), Thompson

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