Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1991-01-25
1992-08-04
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
2504923, 250398, 250251, H01J 37317
Patent
active
051361710
ABSTRACT:
Methods and apparatus for neutralization of a workpiece such as a semiconductor wafer in a system wherein a beam of positive ions is applied to the workpiece. The apparatus includes an electron source for generating an electron beam and a magnetic assembly for generating a magnetic field for guiding the electron beam to the workpiece. The electron beam path preferably includes a first section between the electron source and the ion beam and a second section which is coincident with the ion beam. The magnetic assembly generates an axial component of magnetic field along the electron beam path. The magnetic assembly also generates a transverse component of the magnetic field in an elbow region between the first and second sections of the electron beam path. The electron source preferably includes a large area lanthanum hexaboride cathode and an extraction grid positioned in close proximity to the cathode. The apparatus provides a high current, low energy electron beam for neutralizing charge buildup on the workpiece.
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Kunkel Wulf B.
Leung Ka-Ngo
McKenna Charles M.
Williams Malcom D.
Berman Jack I.
Novack Sheri M.
Varian Associates Inc.
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