Gas and liquid contact apparatus – Fluid distribution – Valved
Patent
1989-03-01
1990-06-05
Miles, Tim
Gas and liquid contact apparatus
Fluid distribution
Valved
261 57, 2611213, 261 35, 261DIG68, F02M 306
Patent
active
049312260
ABSTRACT:
In a charge forming apparatus comprising fuel supply means including an idling orifice and a low speed orifice for feeding the amount of fuel required during the period that an engine is idling or running at a low r.p.m. and a supplemental fuel passage for guiding the fuel to such orifices and an air feeding bypass for keeping the engine idling, the supplemental fuel passage is connected to a portion of the bypass upstream of a manually operable valve for regulating the flow rate of air by means of a connecting path. A negative pressure generated on the engine side rather than on a throttle valve makes negative the supplemental fuel passage and the bypass, but a negative pressure on the upstream side of a valve of the bypass varies in correspondence with the effective path area varied by the valve. Depending upon a difference in negative pressure between the upstream of the valve of the bypass and the supplemental fuel passage, a part of air flows into the supplemental fuel passage, or a part of fuel flows in the bypass, causing the fuel for idling to vary in primary proportion to the amount of air fed through the bypass, thereby keeping the air/fuel rate of a mixture constant all the time.
REFERENCES:
patent: 2340954 (1944-02-01), Garretson
patent: 3043572 (1962-07-01), Ott et al.
patent: 3085791 (1963-04-01), Phillips
patent: 3146844 (1964-09-01), Carlson
patent: 3167599 (1965-01-01), Brown et al.
patent: 3252539 (1966-05-01), Ott et al.
patent: 3404872 (1968-10-01), Nutten
patent: 3544083 (1970-12-01), Currie
patent: 3608874 (1971-09-01), Beckmann
patent: 3878271 (1975-04-01), Garcea
patent: 3931372 (1976-01-01), Pierlot
patent: 4283354 (1981-08-01), Schauer et al.
Miles Tim
Shinagawa Diecasting Co., Ltd.
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