Charge-coupled device image sensor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device

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257231, 257233, 257291, 257297, 257432, 257435, H01L 27148, H01L 29768, H01L 31113, H01L 310232

Patent

active

058442642

ABSTRACT:
A charge-coupled device image sensor includes a substrate, a buried channel region of a first conductivity type, formed in the substrate to a predetermined depth, for transferring signal charges, a first high concentration impurity region of a second conductivity type, formed in the substrate adjacent to the buried channel region, forming a channel stop, a first surface channel region of the second conductivity type, formed on the buried channel region, for transferring dark current charges, a second high concentration impurity region of the first conductivity type, formed on the first high concentration impurity region, for removing dark current charges from the surface channel region, and a second surface channel region of the second conductivity type formed to a predetermined depth in the substrate between the second high concentration impurity region and the first surface channel region.

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