Measuring and testing – Specimen stress or strain – or testing by stress or strain... – Specified electrical sensor or system
Reexamination Certificate
2003-04-03
2004-12-28
Noori, Max (Department: 2855)
Measuring and testing
Specimen stress or strain, or testing by stress or strain...
Specified electrical sensor or system
Reexamination Certificate
active
06834549
ABSTRACT:
BACKGROUND
Photolithography systems have been using soft polymer-based pellicles to protect masks/reticles from particle and contamination. The current pellicle mounting technique (pellicle-to-reticle and pellicle-to-frame) is a combined mechanical and chemical adhesion process. Large compression, i.e., a high stress level, is applied to the adjoining reticle and pellicle system with adhesive applied in the gap between them. In order to achieve a hermetical seal and reliable bonding, pressure as high as 27,000 kg/m
2
has been commonly applied.
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Paul Goutam
Shu Emily Yixie
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