Characterizing flare of a projection lens

Details Characterizing flare of a projection lens Characterizing flare of a projection lens

2007-03-13

2007-03-13

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C382S145000, C382S149000

Reexamination Certificate

active

10933090

ABSTRACT:
Flare of an imaging system is measured using resist by employing the imaging system to directly expose a first part of the resist at an image plane of the imaging system to a first dose of radiation and to indirectly expose a second part of the resist as a result of flare. The imaging system exposes the second part of the resist to a second dose of radiation. Flare of the imaging system is determined from a pattern that is formed in the second part of the resist.

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