Characterization of semiconductor resist material during process

Details Characterization of semiconductor resist material during process Characterization of semiconductor resist material during process

1988-03-01

1989-10-17

Evans, F. L.

Optics: measuring and testing

For optical fiber or waveguide inspection

356381, 356432, 356446, G01B 1100

Patent

active

048742406

ABSTRACT:
Several methods for evaluating certain changes induced in a film of semiconductor resist material after the coat process and before or at completion of the softbake process, by monitoring thickness of and absorption by a film of resist material.

REFERENCES:
patent: 4669873 (1987-06-01), Wirz

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