Chamfered semiconductor wafer and method of manufacturing...

Active solid-state devices (e.g. – transistors – solid-state diode – Physical configuration of semiconductor

Reexamination Certificate

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C438S255000, C451S044000

Reexamination Certificate

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06900522

ABSTRACT:
In a semiconductor wafer (W) having a periphery thereof chamfered, and having at least a main surface side thereof subjected to mirror finishing, an inclined surface (21) is formed on the periphery of the wafer, such that has an angle (θ) of inclination of the inclined surface (21) with respect to a main surface (10) is not smaller than 5° and not larger than 25°, and at the same time a length (L) of the same in the radial direction of the wafer is 100 μm or longer. Further, the inclined surface is configured to have a non-mirror-finished portion (21b) toward the periphery of the wafer.

REFERENCES:
patent: 5514025 (1996-05-01), Hasegawa et al.
patent: 6234879 (2001-05-01), Hasegawa et al.
patent: 6284658 (2001-09-01), Kato et al.
patent: 6583029 (2003-06-01), Abe et al.
patent: 1 150 339 (2001-10-01), None
patent: 2-275613 (1990-11-01), None
patent: 02-275613 (1990-11-01), None
patent: 6-61201 (1994-03-01), None
patent: 06-061201 (1994-03-01), None
patent: 9-251934 (1997-09-01), None
patent: 09251934 (1997-09-01), None

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