Chamber having discharge base

Furnaces – Refuse incinerator – With means for advancing or handling refuse or residue

Reexamination Certificate

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Details

C110S16500A, C110S285000, C110S255000

Reexamination Certificate

active

06877445

ABSTRACT:
A chamber having a discharge base discharges an oversize fraction of a material and a fine fraction of the material separately from the chamber. The discharge base for the chamber for the heat treatment of the material is capable of separating the fine fraction of the material from the oversize fraction of the material. The discharge base has a plurality of conveyor elements which are movable to and fro for the discharge of the oversize fraction of the material. The discharge base is also provided with separator openings for separating out the fine fraction of the material. The conveyor elements are of bar-shape construction and are disposed in parallel to one another on the discharge base to be moveable in the direction of their longitudinal extent, and the separator openings are formed by longitudinal gaps between the conveyor elements.

REFERENCES:
patent: 1973149 (1934-09-01), Tulip
patent: 2033576 (1936-03-01), Hofft
patent: 3057309 (1962-10-01), Turner et al.
patent: 3771470 (1973-11-01), Hampton
patent: 4320710 (1982-03-01), Steiner et al.
patent: 4563959 (1986-01-01), Fujiwara
patent: 4676176 (1987-06-01), Bonomelli
patent: 4884516 (1989-12-01), Linsen
patent: 4913067 (1990-04-01), Gaskin et al.
patent: 4987837 (1991-01-01), Reschly et al.
patent: 5078065 (1992-01-01), Tsunemi et al.
patent: 5476377 (1995-12-01), Kupper et al.
patent: 5915308 (1999-06-01), May et al.
patent: 6230633 (2001-05-01), Magaldi et al.
patent: 6266883 (2001-07-01), Heinemann et al.

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