Chamber for a high energy excimer laser source

Details Chamber for a high energy excimer laser source Chamber for a high energy excimer laser source

2008-05-06

2008-05-06

Harvey, Minsun Oh (Department: 2828)

Coherent light generators

Particular active media

Gas

C372S058000, C372S065000

Reexamination Certificate

active

11447502

ABSTRACT:
A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electrical conductor may extend through the orifice to pass an electric current into the chamber volume. A member may be disposed between the conductor and the wall for preventing gas flow through the orifice to allow a chamber pressure to be maintained in the volume. The chamber may further comprise a pressurized compartment disposed adjacent to the orifice for maintaining a pressure on at least a portion of the outside surface of the wall to reduce bowing of the wall near the orifice due to chamber pressure.

REFERENCES:
patent: 4719641 (1988-01-01), Muller et al.
patent: 2002/0196830 (2002-12-01), Ujazdowski et al.

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