Chamber dry cleaning

Details Chamber dry cleaning Chamber dry cleaning

2011-01-04

2011-01-04

Hassanzadeh, Parviz (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With plasma generation means remote from processing chamber

C118S715000, C118S732000, C118S7230ER, C118S7230IR, C156S345330, C156S345340

Reexamination Certificate

active

07862683

ABSTRACT:
An apparatus and method for improving the chamber dry cleaning of a PECVD system. The apparatus includes an annular gas ring with multiple outlets for introducing a cleaning gas into the process chamber, and the method includes using the gas ring to introduce a cleaning species from a remote plasma source into the processing chamber.

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English language Abstract for JP 2001-131751.
Machine translation for JP 2001-131751.
International Preliminary Report on Patentability issued on Jun. 3, 2008, in PCT/US2006/040358.

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