Chalcogenide product

Details Chalcogenide product Chalcogenide product

1981-01-05

1984-02-28

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Imaged product

430 14, 430271, 430523, 430495, G03C 524

Patent

active

044342179

ABSTRACT:
A layer of a chalcogenide glass resist material, on a substrate on which a microlithographic pattern is to be formed, has a deposit of silver halide on its outer surface. By actinic irradiation a latent silver image replicating the desired pattern is formed in the halide deposit. This image is developed to a metallic silver, which is used to photodope the resist material for subsequent etching to produce the microlithographic pattern on the substrate. Positive and negative patterns are possible from the same starting laminate. One form of a microlithograhic pattern is a mask for producing electronic circuits.

REFERENCES:
patent: 3511661 (1970-05-01), Rauner et al.
patent: 3578451 (1971-05-01), Doggett
patent: 3637383 (1972-01-01), Hallman et al.
patent: 4127414 (1978-11-01), Yoshikawa et al.
patent: 4188215 (1980-02-01), Sato et al.
Yoshikawa, et al.: A Novel Inorganic Photoresist Utilizing Ag Photodoping in Se-Ge Glass Films, Applied Physics Letters, vol. 29, No. 10, Nov. 1976, pp. 677-679.

Affiliated with

Also associated with

Rating

Chalcogenide product does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chalcogenide product, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chalcogenide product will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-759353