Cesium injection system for negative ion duoplasmatrons

Details Cesium injection system for negative ion duoplasmatrons Cesium injection system for negative ion duoplasmatrons

1977-06-06

1978-06-06

Dixon, Harold A.

Radiant energy

Ion generation

Methods

250425, H01J 2700

Patent

active

040938581

ABSTRACT:
Longitudinally extending, foraminous cartridge means having a cylindrical side wall forming one flat, circular, tip end surface and an opposite end; an open-ended cavity, and uniformly spaced orifices for venting the cavity through the side wall in the annulus of a plasma ring for uniformly ejecting cesium for coating the flat, circular, surface. To this end, the cavity is filled with a cesium containing substance and attached to a heater in a hollow-discharge duoplasmatron. By coating the flat circular surface with a uniform monolayer of cesium and locating it in an electrical potential well at the end of a hollow-discharge, ion duoplasmatron source of an annular hydrogen plasma ring, the negative hydrogen production from the duoplasmatron is increased. The negative hydrogen is produced on the flat surface of the cartridge and extracted by the electrical potential well along a trajectory coaxial with the axis of the plasma ring.

REFERENCES:
patent: 3374384 (1968-03-01), Donnally
patent: 3740554 (1973-06-01), Morgan
patent: 3864575 (1975-02-01), Hashmi

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