Cerium oxide abrasive and method of polishing substrates

Details Cerium oxide abrasive and method of polishing substrates Cerium oxide abrasive and method of polishing substrates

2005-03-08

2005-03-08

Marcheschi, Michael (Department: 1755)

Abrasive tool making process, material, or composition

With inorganic material

Metal or metal oxide

C051S307000, C106S003000, C423S263000, C438S692000, C438S693000

Reexamination Certificate

active

06863700

ABSTRACT:
A cerium oxide abrasive slurry having, dispersed in a medium, cerium oxide particles whose primary particles have a median diameter of from 30 nm to 250 nm, a maximum particle diameter of 600 nm or smaller, and a specific surface area of from 7 to 45 m2/g, and slurry particles have a median diameter of from 150 nm to 600 nm. The cerium oxide particles have structural parameter Y, representing an isotropic microstrain obtained by an X-ray Rietvelt method (with RIETAN-94), of from 0.01 to 0.70, and structural parameter X, representing a primary particle diameter obtained by an X-ray Rietvelt method (with RIETAN-94), of from 0.08 to 0.3. The cerium oxide abrasive slurry is made by a method of obtaining particles by firing at a temperature of from 600° C. to 900° C. and then pulverizing, then dispersing the resulting cerium oxide particles in a medium.

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