Ceramic wiring substrate and process for producing the same

Plastic and nonmetallic article shaping or treating: processes – Including step of generating heat by friction

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

264 65, 427 96, 4271262, 4273762, 428209, 428210, 428901, 501 69, C04B 3332, H05K 312

Patent

active

047342331

ABSTRACT:
A ceramic wiring substrate and a process for producing the same having a conductive layer, obtained by sintering a conductive paste comprising 85 to 97% by weight of a tungsten powder and 15 to 3% by weight of a sintering additive (for conductive metal) having a specified composition, on a mullite ceramic substrate.

REFERENCES:
patent: 3615763 (1971-10-01), Flock
patent: 3857923 (1974-12-01), Gardner et al.
patent: 4159295 (1979-06-01), Mazzuchelli et al.
patent: 4313900 (1982-02-01), Gonzales, Jr. et al.
patent: 4345955 (1982-08-01), Bakermans et al.
patent: 4397800 (1983-08-01), Suzuki et al.
patent: 4510000 (1985-04-01), Kumar et al.
patent: 4521449 (1985-06-01), Arnold et al.
patent: 4551357 (1985-11-01), Takeuihi et al.
patent: 4574094 (1986-03-01), DeLuca et al.
patent: 4620264 (1986-10-01), Ushifusa et al.
patent: 4624896 (1986-11-01), Watanabe et al.
patent: 4632846 (1986-12-01), Fujinaka et al.
patent: 4649125 (1987-03-01), Takeuchi et al.
patent: 4678683 (1987-07-01), Pasco et al.
patent: 4684446 (1987-08-01), Charles et al.
patent: 4695504 (1987-04-01), Watanabe et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Ceramic wiring substrate and process for producing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ceramic wiring substrate and process for producing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ceramic wiring substrate and process for producing the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1088156

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.