Coating processes – Coating by vapor – gas – or smoke
Reexamination Certificate
2008-07-08
2008-07-08
Meeks, Timothy (Department: 1792)
Coating processes
Coating by vapor, gas, or smoke
C427S255230, C427S255280, C427S255380, C427S255394
Reexamination Certificate
active
10515450
ABSTRACT:
The process of Polymer Assisted Chemical Vapor Deposition (PACVD) and the semiconductor, dielectric, passivating or protecting thin films produced by the process are described. A semiconductor thin film of amorphous silicon carbide is obtained through vapor deposition following desublimation of pyrolysis products of polymeric precursors in inert or active atmosphere. PA-CVD allows one or multi-layers compositions, microstructures and thicknesses to be deposited on a wide variety of substrates. The deposited thin film from desublimation is an n-type semiconductor with a low donor concentration in the range of 1014-1017cm−3. Many devices can be fabricated by the PA-CVD method of the invention such as; solar cells; light-emitting diodes; transistors; photothyristors, as well as integrated monolithic devices on a single chip. Using this novel technique, high deposition rates can be obtained from chemically synchronized Si—C bonds redistribution in organo-polysilanes in the temperature range of about 200-450° C.
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Aktik Cetin
Scarlete Mihai
Meeks Timothy
Sixtron Advanced Materials, Inc.
Stouffer Kelly M
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