Ceramic substrate, ceramic heater, electrostatic chuck and...

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

Reexamination Certificate

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C219S460100, C219S461100, C219S465100, C219S543000, C219S546000, C219S468100, C219S548000

Reexamination Certificate

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07078655

ABSTRACT:
A ceramic substrate for semiconductor manufacture and/or inspection which is conducive to decrease in α-rays radiated to prevent electrical errors, and to decrease an electrostatic chucking force such as heater or wafer prober, generation of particles, and circuit defects. The ceramic substrate is configured such that the level of α-rays radiated from the surface of the ceramic substrate is not higher than 0.250 c/cm2.hr.

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