Coating apparatus – Gas or vapor deposition – With treating means
Patent
1993-02-22
1994-10-18
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118715, C23C 1650
Patent
active
053564758
ABSTRACT:
A method and apparatus for eliminating radio frequency arcing in a wafer coating plasma process, called PECVD, is disclosed. In the PECVD process, semiconductor wafers are mounted on graphite paddles of a boat assembly held inside a furnace tube. The graphite paddles are arranged in parallel planes and held in a spaced apart relationship by ceramic rods. The present invention spacers have small diameter end portions and are disposed coaxially on the ceramic rods. The spacers support the graphite paddles only on the small diameter end portions, thus separating the graphite paddles from the ceramic rods, as well as simultaneously maintaining the spacing between adjacent graphite paddles on a common ceramic rod. An optional end spacer is disposed on the end of the ceramic rod and is held in place by an optional ceramic nut screwed onto threads formed on the end of the ceramic rod. The nut compresses the end spacer against the graphite paddle thereby pushing together the entire sequence of alternating graphite paddles and spacers on the common ceramic rod. An alternative embodiment spacer having a flange can also be used to separate the graphite paddle from the ceramic rod and is used in conjunction with conventional spacers.
REFERENCES:
patent: 4223048 (1980-09-01), Engle, Jr.
patent: 4491606 (1985-01-01), Plosler et al.
patent: 4633051 (1986-12-01), Olson
patent: 4761301 (1988-08-01), Ellenberger et al.
Diiorio Salvatore
Jackson Quentin
Baskin Jonathan D.
Breneman R. Bruce
LSI Logic Corporation
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