Ceramic parts and a producing process thereof

Details Ceramic parts and a producing process thereof Ceramic parts and a producing process thereof

1997-12-02

2001-07-10

Watkins, III, William P. (Department: 1772)

Stock material or miscellaneous articles

Structurally defined web or sheet

Continuous and nonuniform or irregular surface on layer or...

C428S698000, C428S702000, C428S409000, C428S410000, C428S220000, C264S600000, C264S662000, C264S665000, C264S668000, C264S678000, C264S681000, C219S385000, C219S553000, C392S416000, C118S725000

Reexamination Certificate

active

06258440

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to ceramic parts which are produced with resistive characteristics to be exposed to a corrosive gas as well as a process for producing the same.
2. Related Art Statement
In the semiconductor-producing apparatuses, halogen-based corrosive gases are used as an etching gas, a cleaning gas, etc. Since various parts used in the above atmospheres are exposed to the halogen-based corrosive gases such as CIF
3
or NF
3
or a plasma thereof, the parts need to be anti-corrosive against the halogen-based corrosive gases. As highly anti-corrosive materials, dense alumina and aluminum nitride are known. JP-A 5-251,365 describes that dense alumina and aluminum nitride have high corrosion resistive properties against the corrosive halogen-based gases.
The present inventors have been developing various parts made of dense alumina, which are to be placed inside of semiconductor-producing apparatuses. However, they encountered the following problem during their developing course. For example, when plasma was produced in an etching apparatus by using a halogen-based corrosive gas, particles came out from a dense alumina part.
The present inventors ground the surface of a dense alumina member, then mirror-polished and further cleaned the polished surface by brushing. However, particles were still generated when the halogen-based corrosive gas was flown.
SUMMARY OF THE INVENTION
An object of the present invention is therefore to provide ceramic parts to be exposed to corrosive gases, and is aimed at suppressing the occurrence of particles from the ceramic parts if they are exposed to corrosive gases. The present invention is to provide a process for producing such ceramic parts.
The present invention is directed to a sintered ceramic part to be exposed to a corrosive gas, said ceramic part having been machined, wherein ceramic grains exposed to a machined surface of the ceramic part have machined surfaces, and are made round through material transfer inside the grains.
The present invention is also directed to a process for producing a sintered ceramic part to or resistive to be exposed to a corrosive gas, said process comprising the steps of obtaining a machined body having a given shape by at least grinding a surface of a sintered ceramic body, and annealing the machined body.
These and other objects, features and advantages of the invention will be apparent from the following description of the invention when taken in conjunction with the attached drawings, with the understanding that some modifications, variations and/or changes of the same could be easily made by the skilled person in the art to which the invention pertains.


REFERENCES:
patent: 3791861 (1974-02-01), Sundahl, Jr.
patent: 4681538 (1987-07-01), DeLucca et al.
patent: 0 567 686 A2 (1993-11-01), None
patent: 0 653 395 A1 (1995-05-01), None
patent: 3-228502 (1991-03-01), None
Database WPI; Section Ch, Week 9211; Derwent Publications Ltd., London, GB; XP002086142 & JP 04 026546 A (NGK Insulators Ltd); Jan. 29, 1992 *abstract*.
Database WPI; Section Ch, Week 9147; Derwent Publications Ltd., London, GB; Class L02, AN 91-343117 XP002086143 & JP 03 228502 A (Mitsubishi Materials Corp); Oct. 9, 1991 *abstract*.

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