Ceramic heater system and substrate processing apparatus...

Details Ceramic heater system and substrate processing apparatus... Ceramic heater system and substrate processing apparatus...

2005-10-04

2005-10-04

Zervigon, Rudy (Department: 1763)

Coating apparatus

Gas or vapor deposition

Work support

C156S345510, C156S345520, C156S345530

Reexamination Certificate

active

06951587

ABSTRACT:
A ceramic heater system has a ceramic heater base having a substrate-mounting surface formed on the top surface thereof and a heater, buried in the heater base, for heating a substrate. A fluid passage is formed buried in the heater base below where the heater is buried. The heater base is cooled as a fluid whose temperature is lower than the temperature of the heater base is let flow in the fluid passage. A substrate processing apparatus has the ceramic heater system installed in a process chamber whose vacuum state can be maintained, a gas supply mechanism for feeding a gas into the process chamber, and a power supply. The substrate processing apparatus performs a heat treatment, etching and film deposition on a substrate placed in the process chamber.

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Machine Translation from http://www1.ipdl.jpo.go.jp/PA1/cgi-bin/PA1DETAIL.

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