Centrifugal wafer processor and method

Details Centrifugal wafer processor and method Centrifugal wafer processor and method

1998-06-24

2000-09-26

Ferensic, Denise L.

Drying and gas or vapor contact with solids

Process

By centrifugal force

34317, 34321, 34 59, F26B 508

Patent

active

061228370

ABSTRACT:
A dryer for processing semiconductor substrates which rotates a carrier containing the substrates within a housing in combination with a bubbler which heats and directs a gas containing a water tension reducing vapor to the housing to contact the substrates and thereby hasten drying, decrease water marking, and decrease contamination.

REFERENCES:
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patent: 4571850 (1986-02-01), Hunt et al.
patent: 4841645 (1989-06-01), Bettcher et al.
patent: 5050126 (1991-09-01), Tanaka et al.
patent: 5054210 (1991-10-01), Schumacher et al.
patent: 5143103 (1992-09-01), Basso et al.
patent: 5271774 (1993-12-01), Leenaars et al.
patent: 5443540 (1995-08-01), Kamikawa
patent: 5884640 (1999-03-01), Fishkin et al.
patent: 5954911 (1999-09-01), Bergman

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