Centrifugal wafer processor

Details Centrifugal wafer processor Centrifugal wafer processor

1980-03-06

1981-11-17

Bleutge, Robert L.

Cleaning and liquid contact with solids

Apparatus

Automatic controls

134140, 134153, 134155, 134200, 156345, B08B 302

Patent

active

043005810

ABSTRACT:
An automatic production apparatus for processing semiconductor wafers which include a rotor rotatable about a substantially horizontal axis where the rotor includes a removable carrier capable of holding a plurality of semiconductor wafers or glass photomask plates and a plastic-coated bar for retaining the semiconductor wafers in the carrier when inverted at low RPM's and a plurality of spray nozzles for providing the processing medium and a recessed drain for removing the expended processing medium. A timing device sequentially controls the processing functions and structure is provided to accomplish these functions.

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patent: 3808065 (1974-04-01), Robinson et al.
patent: 3964957 (1976-06-01), Walsh
patent: 3970471 (1976-07-01), Bankes et al.
patent: 4077416 (1978-03-01), Johnson, Jr. et al.
Mathisen; IBM Tech. Disclosure Bulletin, vol. 10, No. 3 8/67; Etch Control Probe, pp. 193 & 194.

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