Centrifugal wafer processor

Details Centrifugal wafer processor Centrifugal wafer processor

1984-05-17

1986-02-25

Camby, John J.

Drying and gas or vapor contact with solids

Apparatus

Chamber seals

34133, 432242, F26B 2500, F26B 1102, F27D 118

Patent

active

045718504

ABSTRACT:
In a rinser/dryer for carriers of semiconductor wafers, a rotatable frame containing the carrier is directly mounted to, and cantilevered from the drive motor. A container encloses the rotatable frame and carrier. A gas pressurized labyrinth seal separates the inside of the container from the drive motor to prevent contamination. A raised portion in the labyrinth seal, with gas inlets on each side of the raised portion, forms a pressure barrier inhibiting the passage of moisture and contaminates across the barrier.

REFERENCES:
patent: 2975528 (1961-03-01), Shewmon
patent: 4207686 (1980-06-01), Daily

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