Centrifugal spin dryer for semiconductor wafer

Details Centrifugal spin dryer for semiconductor wafer Centrifugal spin dryer for semiconductor wafer

1989-12-18

1991-02-05

Bennet, Henry A.

Drying and gas or vapor contact with solids

Apparatus

With apparatus using centrifugal force

34 8, 34184, 118 52, 118728, F26B 1724

Patent

active

049893459

ABSTRACT:
Apparatus for spin drying a semiconductor wafer by centrifugal force. The apparatus spins the wafer about a selected axis while the wafer is being rinsed, and then displaces the wafer away from the axis along a path of travel circumscribing the axis to dry the wafer.

REFERENCES:
patent: 4313266 (1982-02-01), Tam
patent: 4489501 (1984-12-01), Aigo
patent: 4525938 (1985-07-01), Aigo
patent: 4651440 (1987-03-01), Karl
patent: 4677758 (1987-07-01), Aigo
patent: 4677759 (1987-07-01), Inamura
patent: 4724619 (1988-02-01), Poli et al.
patent: 4851263 (1989-07-01), Ishii et al.

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