Centering support for a rotatable wafer support susceptor

Details Centering support for a rotatable wafer support susceptor Centering support for a rotatable wafer support susceptor

1980-03-24

1981-06-23

Kaplan, Morris

Electric heating

Metal heating

Of cylinders

118730, 219 1067, C23C 1308, H05B 610

Patent

active

042752825

ABSTRACT:
A support mechanism for a rotatable wafer-support susceptor adapted for rotation by a shaft in a vertical orientation. The support mechanism comprises a quartz pedestal tube resting with frictional engagement on a metallic table fixed to the shaft. The pedestal supports, with frictional engagement, the base of the susceptor and is rotated by frictional engagement with the table. Means disposed within an aperture of the base and within the tube constrain the base, and thus the susceptor, and the tube to symmetrical rotation about the shaft passing through a centrally located aperture in the base.

REFERENCES:
patent: 3696779 (1972-10-01), Murai et al.
patent: 3704987 (1972-12-01), Arndt et al.
patent: 3745969 (1973-07-01), Huftman et al.
patent: 3862397 (1975-01-01), Anderson et al.
patent: 4062318 (1977-12-01), Ban et al.
patent: 4099041 (1978-07-01), Berkman et al.

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