Earth boring – well treating – and oil field chemistry – Well treating – Contains inorganic component other than water or clay
Patent
1997-10-03
2000-11-28
Tucker, Philip
Earth boring, well treating, and oil field chemistry
Well treating
Contains inorganic component other than water or clay
507906, 106816, C09K 300, C04B 700
Patent
active
061535621
ABSTRACT:
The present invention provides a cementing composition for an oil or analogous well, essentially constituted by a solid fraction suspended in a liquid medium. The solid fraction is constituted by a coarse fraction with a packing volume fraction .PHI..sub.1 which, according to the invention, is maximised, and a fines fraction x with a packing volume fraction .PHI..sub.2 which is less than or equal to the volume fraction x.sub.0 such that ##EQU1## The invention also provides a method of maximising the value of .PHI..sub.1. The invention can minimise fluid loss whatever the materials selected for a cementing composition.
REFERENCES:
patent: 4333765 (1982-06-01), Shaw
patent: 5151203 (1992-09-01), Riley et al.
patent: 5234754 (1993-08-01), Bache
patent: 5489574 (1996-02-01), Miano et al.
patent: 5522926 (1996-06-01), Richard et al.
patent: 5569324 (1996-10-01), Totten et al.
patent: 5571318 (1996-11-01), Griffith et al.
patent: 5641815 (1997-06-01), Fehlmann
Database WPI, Week 9519, Derwent Publications Ltd., London, GB; An 95-145613, XP002033057 & SU 1 837 056 A (Town Equip Res Des Inst) *abstract*.
Baret Jean-Francois
Villar John
Nava Robin C.
Schlumberger Technology Corporation
Tucker Philip
Waggett Gordon G.
LandOfFree
Cementing slurry and method of designing a formulation does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cementing slurry and method of designing a formulation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cementing slurry and method of designing a formulation will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1725751