Cell library that can automatically avoid forbidden pitches

Details Cell library that can automatically avoid forbidden pitches Cell library that can automatically avoid forbidden pitches

2007-07-31

2007-07-31

Sherali, Ishrat (Department: 2624)

Image analysis

Image enhancement or restoration

Intensity, brightness, contrast, or shading correction

Reexamination Certificate

active

10426545

ABSTRACT:
Resolution enhancement techniques (RETs) aid in accurately transferring features on a layout to a wafer. Unfortunately, RETs may work well at one pitch but not another pitch. If image quality falls below an acceptable threshold at a certain pitch, then such a pitch is called a forbidden pitch. A cell library cell that can automatically avoid forbidden pitches is provided. In this method, evaluation points on edges of a feature in a cell can be analyzed based on a RET and a lithography model. Using this analysis, any forbidden pitch for the feature can be identified. Additionally, any forbidden pitch can be changed to an acceptable pitch, i.e. a pitch resulting in an acceptable image quality. The forbidden pitch information and the associated acceptable pitch information for the feature can be stored in a database to facilitate analyzing other features/cells.

REFERENCES:
patent: 5689432 (1997-11-01), Blaauw et al.
patent: 6470477 (2002-10-01), Scott
patent: 6611934 (2003-08-01), Whetsel, Jr.
patent: 6783904 (2004-08-01), Strozewski et al.

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