Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1988-10-05
1992-10-13
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
B01D 6142, C25D 1300
Patent
active
051548143
ABSTRACT:
A cell handling apparatus is provided with a device for moving cells which are held in chambers of the apparatus, at predetermined periods, preferably a device for generating pulse-like changes in fluid pressure of the chambers, so as to prevent the same portions of the cells from remaining in contact with the wall surfaces of the chambers over a predetermined period of time.
REFERENCES:
patent: 4441972 (1984-04-01), Pohl
patent: 4800163 (1989-01-01), Hibi et al.
patent: 4894343 (1990-01-01), Tanaka et al.
patent: 4895805 (1990-01-01), Sato
Patent Abstracts of Japan, vol. 11, No. 214 (C-434) [2661] Jun. 6, 1987.
Kawamura Yoshio
Kohida Hiroyuki
Sakurano Masatoshi
Sato Kazuo
Tanaka Shinji
Hitachi , Ltd.
Koestner Caroline
Niebling John
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