CD metrology method

Details CD metrology method CD metrology method

2006-06-27

2006-06-27

Wachsman, Hal (Department: 2857)

Data processing: measuring, calibrating, or testing

Measurement system in a specific environment

Chemical analysis

C702S127000, C702S172000, C356S625000

Reexamination Certificate

active

07069153

ABSTRACT:
A method for rapidly analyzing data gathered during scatterometry and related methods uses a combination of database lookup, database interpolation and theoretical model evaluation. Database lookup is used to provide an initial mapping between a measured optical response and a set of associated measurement parameters. Interpolation is then used to refine the optical response and parameters. A theoretical model is then repeatedly evaluated to refine the optical response and parameters previously refined by the interpolation. In this way, the present invention avoids the inaccuracies associated with traditional interpolation-based analysis and without incurring the computational complexity associated with real-time database supplementation.

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C.J. Raymond, “Scatterometry for Semiconductor Metrology”, Handbook of Silicon Semiconductor Metrology, A. Diebold, Ed., New York 2001, Chapter 18, pp. 477-513, no month.

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