Caustic-free process for the production of monochloro-diamino-s-

Details Caustic-free process for the production of monochloro-diamino-s- Caustic-free process for the production of monochloro-diamino-s-

1980-02-04

1981-09-08

Ford, John M.

Organic compounds -- part of the class 532-570 series

Organic compounds

Four or more ring nitrogens in the bicyclo ring system

C07D25150

Patent

active

042885949

ABSTRACT:
A new and improved process is provided for preparing monochloro-diamino-s-triazines which are useful as herbicides.
The process comprises reacting in a first stage cyanuric chloride and a selected monoalkylamine hydrochloride at elevated temperature to give a dichloro-monoalkylamino-s-triazine and reacting in a second stage this dichloro-monoalkylamino-s-triazine with an excess of a different monoalkylamine which may be introduced as a pure liquid, as gas or as a solution in water. The third stage of the process consists of an exchange whereby the monoalkylamine hydrochloride of the first stage and the free monoalkylamine of the second stage are generated. The process gives consistent yields in excess of 97% of monochloro-diamino-s-triazines. Because the process is caustic-free and due to the feasibility of recycling the excess of monoalkylamines employed, no serious effluent problems arise.

REFERENCES:
patent: 3074946 (1963-01-01), Rattenbury et al.
patent: 3328399 (1967-06-01), Prill
patent: 3577417 (1971-05-01), Cantrall et al.
patent: 3586679 (1971-06-01), Tandon et al.

Affiliated with

Also associated with

Rating

Caustic-free process for the production of monochloro-diamino-s- does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Caustic-free process for the production of monochloro-diamino-s-, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Caustic-free process for the production of monochloro-diamino-s- will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1193439