Catoptric reduction projection optical system and exposure...

Details Catoptric reduction projection optical system and exposure... Catoptric reduction projection optical system and exposure...

2007-06-19

2007-06-19

Allen, Stephone B. (Department: 2872)

Optical: systems and elements

Mirror

Plural mirrors or reflecting surfaces

C359S850000, C359S857000, C359S858000, C359S861000

Reexamination Certificate

active

10207938

ABSTRACT:
A catoptric reduction projection optical system that uses light of light with a wavelength of 200 nm or less includes six light-reflecting mirrors arranged from an object side to an image side such that said mirrors basically form a coaxial system, wherein a third mirror in said six mirrors is located at a pupil position of said optical system.

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Notice of Reasons for Rejections for Japanese Application No. 2001-230957 issued Sep. 30, 2003 and its English Translation.
Decision of Final Rejection for Japanese Application No. 2001-230957 issued Sep. 28, 2004 and its English Translation.

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