Catoptric projection optical system and exposure apparatus

Details Catoptric projection optical system and exposure apparatus Catoptric projection optical system and exposure apparatus

2005-07-26

2005-07-26

Epps, Georgia (Department: 2873)

Optical: systems and elements

Lens

With reflecting element

C359S858000, C359S861000

Reexamination Certificate

active

06922291

ABSTRACT:
A catoptric projection optical system for projecting a reduced size of a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image between the object surface and image surface, includes six or more mirrors, wherein a position of an exit pupil with respect to the intermediate image is located between the object surface and image surface, and wherein the largest angle between principal rays and an optical axis for angles of view at the position of the exit pupil is sin−1NA or smaller, where NA is a numerical aperture at the side of the image surface.

REFERENCES:
patent: 4701035 (1987-10-01), Hirose
patent: 5815310 (1998-09-01), Williamson
patent: 6033079 (2000-03-01), Hudyma
patent: 6172825 (2001-01-01), Takahashi
patent: 6302548 (2001-10-01), Takahashi et al.
patent: 6353470 (2002-03-01), Dinger
patent: 0 779 528 (1997-06-01), None
patent: 2000-100694 (2000-04-01), None
patent: 2000-235144 (2000-08-01), None
European Patent Office; “European Search Report”; of corresponding European Patent Application No. EP 04 25 0867; dated Jun. 28, 2004; (3 pages).
English abstract of JP 2000-235144.
English abstract of JP 2000-100694.

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