Cationically stabilized aqueous silica dispersion, method...

Details Cationically stabilized aqueous silica dispersion, method... Cationically stabilized aqueous silica dispersion, method...

2011-05-10

2011-05-10

Brunsman, David M (Department: 1732)

Compositions: coating or plastic

Materials or ingredients

Pigment, filler, or aggregate compositions, e.g., stone,...

C106S287110

Reexamination Certificate

active

07938902

ABSTRACT:
Cationically stablished aqueous silica dispersion, method for its production and its use. A method is described for the production of cationically stabilised silica in which silica is cationically stabilised in the form of an aqueous dispersion or a powder by mixing with an acid aminosilane solution. A cationically stabilised silica powder may be obtained by removing the solvent. The cationically stabilised silica dispersion obtained is highly storage stable. Mixing with organic binding agents such as PVA is possible without a significant increase in viscosity. The dispersions are particularly suitable for coating slips for printing media, such as inkjet paper, but also for the surface treatment of substrates, e.g. for the hard coating of plastics, or in parting compounds or abrasives and polishing agents.

REFERENCES:
patent: 6417264 (2002-07-01), Kono et al.
patent: 6420039 (2002-07-01), Field et al.
patent: 6777039 (2004-08-01), Koike et al.
patent: 10033054 (2001-04-01), None
patent: 60106258 (2002-01-01), None
patent: 10311722 (2004-09-01), None
patent: 102004030093 (2006-01-01), None
patent: 1559705 (2005-08-01), None

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