Cationic electrodepositable compositions through the use of sulf

Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

523404, 523411, 523414, 523415, 524901, C25D 1306, C08L 6300, C08L 6302

Patent

active

049330560

ABSTRACT:
A cationic electrodepositable composition containing a resinous phase dispersed in an aqueous medium is disclosed. The resinous phase has basic nitrogen groups which are at least partially neutralized with sulfamic acid or a derivative thereof, that is, an acid of the formula: ##STR1## where R is H or C.sub.1 to C.sub.4 alkyl. The compositions are in the form of relatively small particle size aqueous dispersions, and when used in the process of cationic electrodeposition, enable the formation of thick films with high throwpower. Also, the use of sulfamic acid passivates the anode.

REFERENCES:
patent: 4419467 (1983-12-01), Wismer
patent: 4677168 (1987-06-01), Hoy
patent: 4724244 (1988-02-01), Kempter et al.
"Cathodic Codeposition of Metals and Polymers" by Deinega et al, Kolloidnyi Zhurnal, 37, No. 4, Jul.-Aug. 1975, pp. 691-695.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Cationic electrodepositable compositions through the use of sulf does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cationic electrodepositable compositions through the use of sulf, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cationic electrodepositable compositions through the use of sulf will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-615507

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.