Cathodic sputtering target including means for detecting target

Details Cathodic sputtering target including means for detecting target Cathodic sputtering target including means for detecting target

1981-08-06

1983-02-22

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

043747221

ABSTRACT:
The sputtering cathode (10) forming part of the apparatus of the invention essentially comprises a target (20) made of a material to be sputtered, arranged in front of an intermediate support (15) so as to define a first gas tight chamber (30) of narrow thickness therebetween, intended to be provided with an atmosphere of a gas (37) presenting a high thermal conductivity (under a pressure substantially higher than that prevailing inside the vacuum chamber of the apparatus). The intermediate support (15) in turn forms part of the wall of a second tight chamber adjoining said first tight chamber, which is intended to be circulated with a liquid coolant therewithin. The above arrangement enables the sputtering target (20) to be consumed up to its piercing without causing any damage for the apparatus and/or the substrates being coated, since this piercing will result in a simple gas irruption inside the vacuum chamber (3), which may be at once detected for immediately controlling the automatic shut-off of the sputtering operation. The above arrangement further enables sufficient target cooling throughout the sputtering.

REFERENCES:
patent: 3855110 (1974-12-01), Quinn et al.
patent: 3884793 (1975-05-01), Penfold et al.
patent: 3995187 (1976-11-01), Penfold et al.
patent: 4030996 (1977-06-01), Penfold et al.
patent: 4031424 (1977-06-01), Penfold et al.
patent: 4041353 (1977-08-01), Penfold et al.
patent: 4179351 (1979-12-01), Hawton, Jr. et al.
patent: 4221652 (1980-09-01), Kuriyama

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