Cathodic production of micropores in chromium

Details Cathodic production of micropores in chromium Cathodic production of micropores in chromium

1975-10-08

1977-02-08

Kaplan, G. L.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

204 35R, 204 41, C25D 548

Patent

active

040070999

ABSTRACT:
A metal base which has a decorative chromium plate layer 0.002 to 0.10 mil thick on a nickel or similar substrate, usually 5 to 100 or more times as thick as the chromium plate layer, is used as a cathode in an electric cell in which the electrolyte solution is an aqueous acidic solution of hexavalent chromium in a combined state with oxygen and oxide ions of sulfur, selenium and/or tellurium, preferably the sulfate ion, preferably together with any of certain catalytic metal ions. When the electrolyte solution is heated to no more than about 195.degree. F. but preferably at least 150.degree. F. and a current in the range of about 0.3 to 4.5 amperes per square foot of chromium plate layer is introduced for 20 seconds to 10 minutes, preferably with a gradual increase in current over the first 3 seconds to 3 minutes, the chromium plate layer becomes thoroughly perforated with micropores, protecting the substrate from severe electrolytic attack and consequently protecting the metal base from any normal corrosion.

REFERENCES:
patent: 3479162 (1969-11-01), Yanabu et al.
patent: 3574069 (1971-04-01), Roberts et al.
patent: 3642587 (1972-02-01), Allen et al.
patent: 3838024 (1974-09-01), Austin et al.

Affiliated with

Also associated with

Rating

Cathodic production of micropores in chromium does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cathodic production of micropores in chromium, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cathodic production of micropores in chromium will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1211896