Cathodic particle-assisted etching of substrates

Details Cathodic particle-assisted etching of substrates Cathodic particle-assisted etching of substrates

1996-08-27

1998-03-31

Valentine, Donald R.

Electrolysis: processes, compositions used therein, and methods

Electrolytic erosion of a workpiece for shape or surface...

Internal battery action

205666, 205674, C25F 314

Patent

active

057334323

ABSTRACT:
An electrically conductive substrate (20) is etched by providing an etchant solution having finely divided, electrically conductive particles (40) mixed therein. The electrically conductive particles (40) are made of a material that is cathodic to the substrate (20) and does not dissolve into the etchant solution, with a preferred such material being graphite. The substrate (20) is placed into the etchant solution having the particles (40) therein so that the particles (40) contact the substrate (20), and etched for a period of time sufficient to remove a desired amount of the substrate material. The substrate (20) may be provided with an apertured mask (24) prior to being placed into the etchant solution.

REFERENCES:
patent: 2052962 (1936-09-01), Booe
patent: 3539408 (1970-11-01), Cashau et al.
patent: 4836888 (1989-06-01), Nojiri et al.

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