Cathodic arc deposition system

Details Cathodic arc deposition system Cathodic arc deposition system

1992-05-28

1993-12-14

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

20429811, 20429841, 427540, C23C 1432

Patent

active

052698963

ABSTRACT:
A cathodic arc deposition system includes a cathode made of a film forming material, a shield surrounding a circumferential side of the cathode with a gap, a vacuum chamber having the cathode and the shield therein, and a substrate to have deposited at a surface thereof an ionized film forming material by generating an arc discharge between the cathode and the anode. Either the cathode or the shield is adjusted in height so as to keep the upper edge of the shield at substantially the same vertical level as the upper edge of the cathode.

REFERENCES:
patent: 4556471 (1985-12-01), Bergman et al.
patent: 4559121 (1985-12-01), Mularie
patent: 4929322 (1990-05-01), Sue et al.
patent: 5096558 (1992-03-01), Ehrich
patent: 5103766 (1992-04-01), Yoshikawa et al.
patent: 5126030 (1992-06-01), Tamagaki et al.
Patent Abstracts of Japan, vol. 12, No. 126 (M-687), Apr. 19, 1988, and JP-A-62-252-679, Nov. 4, 1987, R. Nakane, "Arc Length Control Device for Welding Machine".
Patent Abstracts of Japan, vol. 9, No. 171 (C-291), Jul. 16, 1985, and JP-A-60-043-482, Mar. 8, 1985, T. Takeuchi, et al., "Sputtering Device".

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