Cathode sputtering with multiple targets

Details Cathode sputtering with multiple targets Cathode sputtering with multiple targets

1980-03-10

1981-02-24

Williams, Howard S.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, C23C 1500

Patent

active

042526264

ABSTRACT:
Apparatus and methods for depositing a coating on a substrate are disclosed. Cathode sputtering techniques for rapidly depositing a relatively thick coating, of controllable and variable composition using multiple cathodes on a substrate having a complex geometry are developed. The apparatus employed includes a sputtering chamber formed between a center, post cathode, a hollow cylindrical cathode and supplemental cathode targets of a different composition.

REFERENCES:
patent: 3354074 (1967-11-01), Kay
patent: 3979273 (1976-09-01), Panzera et al.
patent: 4090941 (1978-05-01), Wright et al.
E. D. McClanahan et al., "Initial Work on the Application of Protective Coatings to Marine Gas Turbine Components by High-Rate Sputtering" ASME Publication 74-GT-100 (1974).
W. W. Anderson, "Magnetron Reactive Sputtering Deposition of Cu.sub.2 S/CoS Solar Cells", Proceedings, 2nd European Community Photovoltaic Solar Energy Conf. (1979) pp. 890-897.
E. L. Hollar et al., "Composite Film Metallizing for Ceramics", J. Electrochem. Soc., vol. 117, No. 11 (Nov. 1970) pp. 1461-1462.

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